| 摘要 |
<p>PURPOSE:To easily obtain the colored material which has a pattern such as a stripe or a mosaic pattern and clear resolution by copolymerizing a specific monomer with a specific compounding ratio to a dyable photosensitive resin. CONSTITUTION:The copolymer contains 5-80wt% of a vinyl monomer (A) contg. groups having an affinity to an anionic dyestuff, 5-60wt% of a hydrophilic monomer (B) except the vinyl monomer (A), 5-60wt% of a monomer shown by the formula (wherein R is H or CH3, n is 4-8), and 0-30wt% of a hydrophobic monomer (D) except the monomer (C). The titled film is formed on the surface of a substrate, using the dyable photosensitive resin obtd. by adding a photosensitive agent and/or by reacting with a photosensitive compd. to said copolymer followed by irradiating an active ray to the obtd. film to cure it. The obtd. cured film is dyed with the anionic dyestuff.</p> |
