发明名称 PLASMA PROCESSOR
摘要 PURPOSE:To prevent an article to be processed from being contaminated with an impurity and from being damaged by a plasma even if a processing velocity is accelerated by providing a charged particle separating magnet for separating electrons from ions in the plasma to transport only activated gas to a processing chamber. CONSTITUTION:When a microwave is applied from a microwave oscillation source 6 through a microwave oscillation tube 4 and a waveguide 5, and a window member 3 into an activation chamber 1, the microwave in the chamber 1 generates a standing wave. Atmospheric gas is ionized by this electric field to generate a plasma, and the plasma is enclosed by a multipolar cusp magnetic field formed by a permanent magnet 10. The charged particles and the activation gas in the plasma are transported through a transport tube 12 to a reaction chamber 15, where the electrons of the particles are moved in a cyclotron motion by lines of magnetic force formed by a pair of magnets 13a, 13b to be trapped, the ions are deflected and do not arrive at an article 17 to be processed. Thus, since the high density activation gas can be transported as in high density on an article 19 to be processed by high density plasma, the processing velocity is improved, and the article to be processed is not damaged by the plasma.
申请公布号 JPS62179728(A) 申请公布日期 1987.08.06
申请号 JP19860021254 申请日期 1986.02.04
申请人 HITACHI LTD 发明人 SAITO YUTAKA;SASAKI SHINJI
分类号 H01L21/302;C23C16/452;C23C16/511;H01J37/08;H01J37/32;H01L21/3065 主分类号 H01L21/302
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