发明名称 |
OPTICAL INTEGRATED CIRCUIT DEVICE |
摘要 |
PURPOSE:To alleviate an adverse influence of a dislocation or a defect in a substrate to a laser by forming a recess at a position of the substrate to form the laser, and burying the recess with a conductive GaAs to form a buffer layer. CONSTITUTION:A recess is formed on a semi-insulating substrate 1, and the recess is buried with a P-type GaAs by an epitaxially growing method to form a buffer layer 2. The layer 2 alleviates an adverse influence of a dislocation or a defect in the substrate 1 to the layer units 2-8. The alleviating effect can be increased by deepening the recess. many FETs 20 are composed on the substrate 1 in addition to the lasers 2-8. In this case, the lasers 2-8 and the FETs 20 are formed on the same surface irrespective of the depth of the recess. Accordingly, a problem of wiring stepwise difference due to the increased thickness of the buffer layer does not occur.
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申请公布号 |
JPS62173779(A) |
申请公布日期 |
1987.07.30 |
申请号 |
JP19860015107 |
申请日期 |
1986.01.27 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
TAKIGAWA SHINICHI;ITO KUNIO |
分类号 |
H01L27/15;H01L27/095;H01L29/80;H01S5/00;H01S5/026 |
主分类号 |
H01L27/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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