发明名称 OPTICAL INTEGRATED CIRCUIT DEVICE
摘要 PURPOSE:To alleviate an adverse influence of a dislocation or a defect in a substrate to a laser by forming a recess at a position of the substrate to form the laser, and burying the recess with a conductive GaAs to form a buffer layer. CONSTITUTION:A recess is formed on a semi-insulating substrate 1, and the recess is buried with a P-type GaAs by an epitaxially growing method to form a buffer layer 2. The layer 2 alleviates an adverse influence of a dislocation or a defect in the substrate 1 to the layer units 2-8. The alleviating effect can be increased by deepening the recess. many FETs 20 are composed on the substrate 1 in addition to the lasers 2-8. In this case, the lasers 2-8 and the FETs 20 are formed on the same surface irrespective of the depth of the recess. Accordingly, a problem of wiring stepwise difference due to the increased thickness of the buffer layer does not occur.
申请公布号 JPS62173779(A) 申请公布日期 1987.07.30
申请号 JP19860015107 申请日期 1986.01.27
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAKIGAWA SHINICHI;ITO KUNIO
分类号 H01L27/15;H01L27/095;H01L29/80;H01S5/00;H01S5/026 主分类号 H01L27/15
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