发明名称 POSITIVE TYPE PHOTOSENSITIVE LITHOGRAPHIC PLATE
摘要 PURPOSE:To obtain a printing plate superior in resistances to chemicals and ball pen writing by incorporating polyphenol polycondensate naphthoquinonediazidosulfonate specified in characteristics and a cresol novolak resin in a photosensitive layer. CONSTITUTION:The photosensitive layer formed on the grained surface of an anodized aluminum plate contains the ester of the polycondensate of the polyphenol with aldehyde or ketone, with naphthoquinonediazidosulfonic acid having a number average molecular weight of 5.00X10<2>-3.60X10<3>, and a weight average molecular weight of 2.00X10<3>-5.80X10<3>, and an esterification rate of 10-25%, and the polycondensate resin of a mixture of m-cresol and p-cresol in a weight ratio 55:45-99:1 and an aldehyde or a ketone, thus permitting the obtained printing plate to be improved in resistances to chemicals and ball pen writing, erasability of sticking traces, and development latitude.
申请公布号 JPS62143045(A) 申请公布日期 1987.06.26
申请号 JP19850267198 申请日期 1985.11.29
申请人 MITSUBISHI CHEM IND LTD;KONISHIROKU PHOTO IND CO LTD 发明人 TOMIYASU HIROSHI;TAKAHASHI SHICHIRO;SASA NOBUMASA;YAMAMOTO TAKESHI
分类号 G03C1/72;G03F7/00;G03F7/023 主分类号 G03C1/72
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