| 摘要 |
PURPOSE:To prevent the generation of projecting longitudinal stripes on an etched mirror plane by forming a stripe pattern after coating the mirror plane completely by spreading a positive type resist having a thickness of 1/2 or more the depth of the mirror plane after forming the etched mirror plane. CONSTITUTION:On an N-type substrate 1, an N-type cladding layer 2, an active layer 3, a P-type cladding layer 4, a P-type cap layer 5 are laminated and further on the surface, a pattern for an etched mirror is formed by use of a three-layer mask. By using it as an etching mask, reactive ion beam etching using chlorine gas is performed to form an etched mirror plane 10 having a predetermined depth. Next, the three-kind resist is removed and the mirror plane 10 is newly coated with a positive type resist 12 completely. A ridge guide 6 is formed on the mirror plane 10, thereby preventing the generation of projecting longitudinal stripes on the mirror plane 10.
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