METHOD OF SELECTIVE REMOVAL OF OXIDE COATINGS IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES,申请号USD3560280-传众专利搜索

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发明名称	METHOD OF SELECTIVE REMOVAL OF OXIDE COATINGS IN THE MANUFACTURE OF SEMICONDUCTOR DEVICES
摘要
申请公布号	US3560280(A)	申请公布日期	1971.02.02
申请号	USD3560280	申请日期	1969.11.21
申请人	HITACHI LTD.	发明人	SUMIO NISHIDA
分类号	H01L21/311;(IPC1-7):H01L7/00	主分类号	H01L21/311
代理机构		代理人
主权项
地址

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