| 摘要 |
PURPOSE:To remarkably improve the penetrating property of an etching soln. by adding a specified surfactant contg. fluorine to the etching soln. so as to reduce the surface tension of the soln. CONSTITUTION:A surfactant contg. fluorine represented by the formula is added as an essential component to an etching soln. In the formula, Rf is 3-21 C polyfluoroalkyl, R is H, 1-4 C alkyl or hydroxyalkyl, n is an integer of 1-10, X is H or NR<1>R<2>R<3> and each of R<1>, R<2> and R<3> is H, 1-5 C alkyl or hydroxyalkyl. When about 0.01wt% of the surfactant is added to an etching soln. such as buffered hydrofluoric acid, the surface tension of the etching soln. is reduced up to 20 dyn, so the penetrating property of the soln. is remarkably improved.
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