METHOD FOR REMOVING DEPOSIT IN VACUUM DEPOSITION VESSEL

摘要

PURPOSE:To remove easily and perfectly a deposit in a vacuum deposition vessel without damaging the inner wall of the vessel by previously vacuum- depositing Al on the inside of the vessel and removing a deposited layer produced on the inside of the vessel in vacuum deposition stages by the chemical etching of the Al. CONSTITUTION:Al (or Ag) is vacuum-deposited on the inside of a vacuum deposition vessel 1 to form a film 2 before vacuum deposition is carried out. When vacuum deposition is repeatedly carried out in the vessel 1, an unnecessary metallic film 3 is deposited on the inside of the vessel 1. The deposited layer 3 can be stripped and removed easily and perfectly from the vessel 1 by filling an aqueous NaOH soln. 4 into the vessel 1 and dissolving and removing the Al film 2.