| 摘要 |
This invention is directed to the fabrication of flat panel display devices wherein a film of large crystal polysilicon is grown on a substrate. More specifically, this invention is drawn to the fabrication of such devices wherein the substrate is fashioned from a phase separated glass consisting essentially of extremely fine-grained crystals homogeneously dispersed in a glass matrix, the base glass therefor being essentially free from alkali metal oxide and consisting essentially, in mole percent, of 2-6% BaO and/or SrO, 18-26% Al2O3, and 68-80% SiO2.
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