发明名称 METAL ION BEAM DEFLECTION CONTROLLER
摘要 PURPOSE:To prevent spread of beam after deflection control by providing an electron beam supply means for combining a deflected metal ion beam with an electron beam having such charge density as approximately the same as that of the metal ion beam. CONSTITUTION:A copper ion beam 10 is deflected by a deflection electrode 5 while controlled to be focused onto a point, e.g., point P, on the surface of a printed board 9 by means of a focus control electrode 6. Deflection control of the deflection electrode 5 is performed in two-dimensional side in accordance with a wiring pattern to be formed on the surface of the printed board 9, while focus control by means of the focus control electrode 6 is performed simultaneously. The copper ion beam 10 subjected to deflection control and focus control is led to an electron beam supply section 7 and combined with an electron beam emitted from an electron gun 8 with approximately the same charge density as that of the copper ion beam, then radiated onto the surface of the printed board 9 under electrically cancelled condition. Since repelling force will never function between the copper particles, spread of the beam can be prevented.
申请公布号 JPS62105343(A) 申请公布日期 1987.05.15
申请号 JP19850245615 申请日期 1985.11.01
申请人 HITACHI PLANT ENG & CONSTR CO LTD 发明人 MASUDA JUNICHI
分类号 H01J37/147;H01J37/317 主分类号 H01J37/147
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