| 摘要 |
PURPOSE:To eliminate a defect in resist scattering and form a resist film to a uniform thickness by providing a disk with a hole in the center over a glass substrate, and falling resist from the center hole. CONSTITUTION:A resist coating device has a disk 8 fixed with plural fixtures 9 after the glass substrate 1 is fixed on a table 3'. A nozzle 6 is provided in the center hole of the disk 8 and the substrate 1 is rotated by a motor 2 to send resist from a resist tank 4 to the nozzle 6 by a pump 5 and drip it. The substrate 1 rotates, so the resist fills the gap between the substrate 1 and disk 8. When the resist fills the gap sufficiently, the dripping of the resist is stopped and the rotating speed of the motor 2 is risen to scatter the resist with centrifugal force, forming the resist film to a desired thickness. |
