BACK SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE,申请号JP19850232681-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	BACK SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPS6292330(A)	申请公布日期	1987.04.27
申请号	JP19850232681	申请日期	1985.10.17
申请人	NEC CORP	发明人	SUZUKI YOSHIAKI
分类号	H01L21/322	主分类号	H01L21/322
代理机构		代理人
主权项
地址

您可能感兴趣的专利

PAINT BURNING METHOD AND CERAMIC PAINT TRANSFER PAPER

MANUFACTURE OF GLASS PRODUCT

PACKAGE FOR TABULAR LITHIUM AND ITS PACKING METHOD

METHOD OF FILLING PART AND VESSEL

PACKING METHOD AND PACKER

BUILDDUP WELDING EQUIPMENT OF INSIDE SURFACE OF SMALL DIAMETER PIPE

SOLDERING DEVICE

CASTING METHOD OF CAST COPPER ALLOY ARTICLE

SURFACE TREATMENT OF CASTING MOLD

METHOD AND APPARATUS FOR BURRING WORK

AUTOMATIC FEEDING METHOD OF WIRE FOR WELDING

DRILLING METHOD FOR FINE HOLE

CONTROLLER FOR TENSION OF CORE WIRE

INSULATING AMPLIFIER

Pneumatic hydraulic energy converter - has closed oil circuit between pump and motor connected by equalising chamber and cylinder

Rig for sailing surfboard - has split mast designed to tension flat sail between mast halves

Flexible plastic die - for amino plastics structuring has non-stick agent worked into die surfaces