| 摘要 |
PURPOSE:To provide an ion injection type write head which enables the spread of an ion stream to be prevented by constituting an ion injection write head through the operation to emit a focusing pattern beam for photoetching to pierce a region of a conductive film where microholes exist in an insulative sheet and holes of varying diameters on each conductive film on both corona generator and recording paper sides. CONSTITUTION:Holes 10 of about 80mum in dia. are provided in zigzag fashion on an insulative sheet 6 consisting of epoxy resin and outer materials and a conductive film 8, 9 consisting of copper foil, etc. is adhered on both surfaces of the insulative sheet 6 using an adhesive 7. A focusing pattern beam 13 for photoetching is emitted on the conductive film 8 where the holes 10 are positioned. The hole of the conductive film 8 on an incident pattern beam side is larger and the hole of the conductive film 9 on a pattern beam emission side is smaller than the diameter of the hole 10 respectively because of the conically limited focus of the pattern beam. |
