| 摘要 |
PURPOSE:To position a pattern easily and positively, and to improve yield though the degree of integration increases by each forming the rectilinear edge of No.3 alignment mark at regular intervals to the rectilinear edges of No.1 and No.2 alignment marks. CONSTITUTION:In a first process, a first alignment mark, one part thereof has a rectilinear edge, is transferred to an object to be transferred together with a pattern for a first mask. In the next process, a second alignment mark, one part thereof has a rectilinear edge, is transferred where different from the first mark on the object to be transferred together with a pattern for a second mask so that the rectilinear edge runs parallel with the rectilinear edge for the first mark or the extensions of several edge coincide. A third alignment mark with first and second rectilinear edges mutually running parallel with the third mask is shaped, the first and second rectilinear edges are positioned so that respective interval is positioned in the predetermined positional relationship to the rectilinear edges of the first and second marks on the object to be transferred in the next process, and a pattern for the third mask is positioned to the first and second patterns. |
