发明名称 |
A CERAMIC COMPOSITION FOR AN APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE |
摘要 |
A ceramic composition of matter for a process kit and a dielectric window of a reactor chamber wherein substrates are processed in a plasma of a processing gas. The ceramic composition of matter contains a ceramic compound (e.g. Al2O3) and an oxide of a Group IIIB metal (e.g., Y2O3). A method for processing (e.g. etching) a substrate in a chamber containing a plasma of a processing gas. The method includes passing processing power through a dielectric window which is formed from the ceramic composition of matter. |
申请公布号 |
WO0007216(A1) |
申请公布日期 |
2000.02.10 |
申请号 |
WO1999US16282 |
申请日期 |
1999.07.26 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
HAN, NIANCI;SHIH, HONG;YUAN, JIE;LU, DANNY;MA, DIANA |
分类号 |
C04B35/50;B01J19/08;C23C14/00;C23C16/44;H01J37/32;H01L21/205;H01L21/302;H01L21/3065 |
主分类号 |
C04B35/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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