发明名称 Method for etching copper and composition useful therein
摘要 A composition of matter comprising sulfuric acid and guanidine, aminoguanidine, or formylated aminoguanidine. The composition is useful in the preparation of sulfuric acid/hydrogen peroxide etching solutions and in methods for etching copper, most particularly in the manufacture of printed circuits.
申请公布号 US4636282(A) 申请公布日期 1987.01.13
申请号 US19850747037 申请日期 1985.06.20
申请人 GREAT LAKES CHEMICAL CORPORATION 发明人 WONG, KWEE C.
分类号 C23F1/18;(IPC1-7):C23F1/02;B44C1/22;C03C15/00;C03C25/06 主分类号 C23F1/18
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