| 摘要 |
PURPOSE:To obtain a photosensitive resin high in sensitivity, good in water resistance, capable of forming a flat and smooth surface, soluble in alkali, and high in heat resistance by forming the resin having specified 3 kinds of organic structural units. CONSTITUTION:The photosensitive resin has 3 structural units of formulae (I), (II), and (III), and it can be prepared, for example, by hydrolyzing a copolymer of p-vinylphenol and vinyl acetate to obtain a vinylphenol and vinylalcohol copolymer, and condensing the obtained copolymer with a quaternary ammonium salt compound represented by formula (IV) or (V). This photosensitive resin contains the alkali-soluble phenol group, and at least one of styrylpyridinium base and styrylquinolium group extremely high in sensitivity, thus permitting the obtained photosensitive resin to be extremely high in sensitivity, developable with alkali, superior in water resistance, and also in heat resistance due to the presence of the phenol groups. |
