| 摘要 |
PURPOSE:To prevent the reverse surface of a semiconductor substrate from being contaminated with photoresist by making the spin chuck as large as the semiconductor substrate, and incorporating therein a spin chuck which is a little smaller than the spacing between the belts for conveying the semiconductor substrate. CONSTITUTION:Two spin chucks 2, 3 having different diameters, large and small, are provided. The central portion of the spin chuck 3 of the large diameter is hollowed out into the shape of a disk to form an opening, the spin chuck 2 of the small diameter is disposed in the opening 3a, the two spin chucks 2, 3 are disposed concentrically and doubly in the inside and the outside, and the small-diameter spin chuck 2 in the inside is placed so that it can rise and fall in the upward and downward directions (axial directions). The inside spin chuck 2 is set to a diameter which is smaller than the spacing between conveying belts 4, 4. The reverse surface of the substrate is thus protected by the spin chucks 2, 3, and therefore when photoresist is applied with high speed revolution, there is no contamination with the excessive amount of resist.
|
