| 摘要 |
PURPOSE:To position a first sample and a second sample under a non-contacting state by optically observing the parallelism of both samples and adjusting the inclination of the second sample. CONSTITUTION:A first sample such as a mask 1 is fixed and held, and a second sample such as a wafer 2 is retained by a holder consisting of a wafer chuck 3, parallelism thereof can be adjusted, piezos 5, a base 4, a Z stage 11 and X, Y, Q stages 103 so as to be run parallel with the first smaple 1. An optical system 101, which has a plurality of objectives 16 for observing the parallelism of the two first sample 1 and second sample 2 and quantitatively outputs the inclination of the second sample 2, is installed, an output from the optical system 101 is inputted to a controller 102, and the holder for the second sample 2 is driven. |
