| 摘要 |
PURPOSE:To make the contact of an object to be treated and a fluid for treatment uniform by providing a revolving turn table or a reciprocating axis for a carrier and providing a rotary table for the revolving table or the axis. CONSTITUTION:A carrier 2 which has a fixed axis 3 with a gearing 11 and is moved to one direction is provided in the inner bottom of the treatment area 1 of a CVD equipment. A revolving table 4 provided outside with a pinion 5 engaged with a rack 6 which is fixed in the treatment area 1 and has a projected rotation axis 7 is supported with a fixed axis 3 on the carrier 2. A turn table 8 provided outside with a gearing 10 which is engaged with the gearing 11 of the fixed axis 3 is supported by the rotation axis 7 and a semiconductor wafer 9 is placed on the turn table 8. When the carrier 2 is moved, the turn table 8 is revolved and rotated by the operation of each gearing and a reaction gas 14 supplied in the equipment for treatment and the wafer 9 are brought into uniform contact.
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