| 摘要 |
PURPOSE:To reduce the dropping amount of liquid and to eliminate the creepage to the back surface of a semiconductor substrate by disposing an opposing plate in parallel with the substrate through a space in a device for dropping developer on the substrate to develop in a steady state, and by stably holding the developer in the space. CONSTITUTION:A circular semiconductor substrate 2 is placed on a similarly circular semiconductor substrate holding base 1, coated with a developing cup 5, and an opposing disk 3 hung through a supporting rod 6 from the ceiling of the cup 5 is opposed to the substrate 2 through the prescribed space. At this time, the disk 3 uses a disk coated with hydrophilic substance on the surface, and the diameter is equal to or slightly smaller than that of the substrate 2. Thus, the developing device is composed to supply developer 7 through dropping nozzle 4 into the space between the substrate 2 and the disk 3 to retain the developer 7 in the space. Thus, the later washing and further the addition of surfactant can be eliminated to improve the spread of the liquid. |
