发明名称 METHOD AND APPARATUS FOR SURFACE TREATMENT IN VESSEL
摘要 PURPOSE:To reduce the time for treatment and to decrease the amt. of the treating liquid to be used by feeding the treating liquid into a vessel except some space remaining therein, evacuating the inside of the vessel and heating the vessel from the lower part thereby generating the high-velocity circulation flow of the vapor and liquid of the treating liquid. CONSTITUTION:Objects 21 to be treated are disposed on racks 22 in the vessel. A prescribed amt. of the surface treating liquid 2 is fed into the vessel except some space remaining therein. The gas in the space part is evacuated to reduce the inside pressure. Such vessel is hermetically sealed. The treating liquid 2 is heated by a heater 3 for heating and a refrigerant is passed in a cooling pipe 12 to operate the entire part of the vessel as a heat pipe. The evaporated liquid 2 forms vapor flow 9 which is cooled at a high flow rate by the cooling pipe 12 and moves to the low temp. part. Part of the vapor flow 9 collides against the objects 21 and is liquefied, by which the prescribed surface treatment is executed. The remaining flow 9 collides against the pipe 12 and is condensed by heat radiation to form liquid drops 10-a-10-c which are dropped onto the objects 21. The object surfaces are thus subjected to the prescribed treatment.
申请公布号 JPS61221387(A) 申请公布日期 1986.10.01
申请号 JP19850061404 申请日期 1985.03.26
申请人 AKUTORONIKUSU KK 发明人 AKACHI HISATERU
分类号 C23C22/73;B08B3/08;C23C22/78;C23G5/00;C23G5/04 主分类号 C23C22/73
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