发明名称 METHOD FOR CLEANING SUBSTRATE SURFACE
摘要 PURPOSE:To unnecessitate a heating heater or the heating of a mixed solution by a method wherein the mixed solution of sulfuric acid and sulfuric anhydride are mixed with water and the position adjoining to the surface of a substrate to be cleaned, the mixed solution obtained as above and hydrogen peroxide are mixed and supplied on the surface of the substrate. CONSTITUTION:First, water is supplied from a water supplying pipe 25, and a wafer 22 is prewashed. Then, a hydrogen peroxide solution is fed from a pipe 26, and wafer and the hydrogen peroxide solution are dripped on the wafer. Subsequently, oleum is fed from a pipe 24, and the mixed solution of three materials is dripped on the wafer. On the other hand, a chuck 23 is rotated at the same time when water is supplied. The supply of hydrogen peroxide liquid is stopped after the cleaning process is finished, then a post washing is performed using water only, and then the rotation of the chuck is stopped. The above-mentioned operation is repeated for each wafer. When water is added to oleum, sulfuric acid is generated by the reaction of the sulfuric acid anhydride contained in oleum, and hot concentrated sulfuric acid heated up by the high reflected heat is obtained. As a result, a heating heater can be omitted, and heating energy can be economized even when an auxiliary heating heater is necessary.
申请公布号 JPS61105847(A) 申请公布日期 1986.05.23
申请号 JP19840227529 申请日期 1984.10.29
申请人 FUJITSU LTD;MITSUBISHI CHEM IND LTD 发明人 TAKAGI MIKIO;WADA KUNIHIKO;OGAWA TSUTOMU;TAKAMI KOICHI;USHIDA HARUO
分类号 H01L21/304;H01L21/306;(IPC1-7):H01L21/304 主分类号 H01L21/304
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