PROCESSO E DISPOSITIVO PER IL DEPOSITO ELETTROLITICO IN CONTINUO E AD ALTA DENSITA' DI CORRENTE DI UN METALLO DI COPERTURA SU UNA LAMIERA,申请号IT19790027183-传众专利搜索

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发明名称	PROCESSO E DISPOSITIVO PER IL DEPOSITO ELETTROLITICO IN CONTINUO E AD ALTA DENSITA' DI CORRENTE DI UN METALLO DI COPERTURA SU UNA LAMIERA
摘要
申请公布号	IT1127211(B)	申请公布日期	1986.05.21
申请号	IT19790027183	申请日期	1979.11.09
申请人	COCKERILL	发明人	WINAND RENE'
分类号	C25D5/08;C25D7/06;C25D21/00;(IPC1-7):C25C/	主分类号	C25D5/08
代理机构		代理人
主权项
地址

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