发明名称 INFRARED RAY ANNEALING APPARATUS
摘要 PURPOSE:To obtain a fig for infrared ray annealing which assures easy handling by arranging wafers on the groove formed by a pair of supporting bars, holding wafers with another bar from the upper part of wafers and fixing wafers obliquely with such bar in such a position that the projections of bar are engaged with recessed edge of end block. CONSTITUTION:A pair of quartz bars 10, each having V grooves 9 with constant interval, are placed in parallel with the grooves 9 directed upward and these quartz bars are fixed with the quartz blocks 11 at both ends. The upper quartz bar 12 is engaged with the recessed grooves at the upper part of blocks 11 and the V grooves 13 is also provided to the bar 12 in the equal interval as the bar 10. The lower edge of wafer is engaged with the groove 9 of bar 10 in order to vertically erect the wafers, then the bar 12 is moved downward with the upper edge of wafers engaged with the groove 13, and the bar 12 is moved obliquely to downward along the recessed groove of block 11 and projections 15 of bar 12 are engaged with the edge of recessed grooves of block 11. In this case, wafers 14 are perfectly inclined and are fixed. This jig can be formed easily and the wafers can be fixed at the desired angle by using a bar 12 having projections 15 at different positions.
申请公布号 JPS6188534(A) 申请公布日期 1986.05.06
申请号 JP19840210000 申请日期 1984.10.05
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SUZUKI NAOKI;NOZAKI JUNICHI;MIZUGUCHI SHINICHI
分类号 H01L21/26;H01L21/324 主分类号 H01L21/26
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