发明名称 Method for manufacture of III-V group compound semiconductor single crystal
摘要 A III-V group compound semiconductor single crystal is manufactured by a method which comprises adjusting the temperature of a fused layer of raw material for the crystal, based on the electric current signal flowing between a seed crystal and the fused layer of raw material for the crystal, the weight signal of the crystal, and the length signal of the crystal, to levels optimum for the growth of crystal during the contact of the seed crystal with the fused layer, during the formation of the shoulder part of the crystal, and during the formation of the barrel part of the crystal, respectively in the process of crystal growth.
申请公布号 US4586979(A) 申请公布日期 1986.05.06
申请号 US19840596705 申请日期 1984.04.04
申请人 AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY;MINISTRY OF INTERNATIONAL TRADE & INDUSTRY 发明人 KATSUMATA, TOORU;TERASHIMA, KAZUTAKA;NAKAJIMA, HIROAKI;FUKUDA, TSUGUO
分类号 C30B15/20;C30B15/28;(IPC1-7):C30B27/02 主分类号 C30B15/20
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