发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURE THEREOF
摘要 PURPOSE:To uniformize the characteristics of the title device and to quicken the operating speed thereof by a method wherein the base of the n-p-n transistor is connected to the constant-current circuit element through a low-resistance conductor constituted of a poly-crystalline silicon film, whereon a metal silicide film is superposed, and at the same time, each injector is also connected to the constant-current circuit element through the low-resistance conductor. CONSTITUTION:The base and the collector of an n-p-n transistor are coupled to the base terminal through a polycrystalline silicon film 601a, which is brought into a state of low resistance by a metal silicide film 501, and the collector of the p-n-p transistor, which is the constant-current circuit element, is also connected to the base terminal. Moreover, each injector is also connected to an injector terminal 11 through the metal silicide film 501 on a polycrystalline silicon film 601b. By this method, an electrical difference between the collectors of the n-p-n and p-n-p transistors is eliminated.
申请公布号 JPS6174363(A) 申请公布日期 1986.04.16
申请号 JP19840198120 申请日期 1984.09.19
申请人 MITSUBISHI ELECTRIC CORP 发明人 HIRAO TADASHI
分类号 H01L27/082;H01L21/76;H01L21/8222;H01L27/02 主分类号 H01L27/082
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