| 摘要 |
PURPOSE:To transfer only a defective pattern, and to execute an inspection of a pearmeability defect, too, with a high sensitivity and in a short time by superposing plural mask patterns on a photosensitive body to be used and executing an exposure. CONSTITUTION:When a pattern of a mask 100 to be inspected is made positive, a mask 110 having a pattern being in a negative relation to said pattern is generated, a mask 120 having a pattern which has inverted a transmitting part and a non-transmitting part of the mask 100 is reproduced from the mask 100, and a mask 130 having a pattern inverting a transmitting part and a non-transmitting part of the pattern of the mask 110 is reproduced from the mask 110. Subsequently, one pair of masks of a pair of the mask 100 and 110, and a pair of the mask 120 and 130 are used and superposed on a photosensitive body W, and an exposure is executed. Next, a development is executed with respect to the photosensitive body W to which the superposed exposure is executed, and its image is inspected 150. |
