发明名称 MANUFACTURING EQUIPMENT OF SEMICONDUCTOR
摘要 PURPOSE:To enable discharging impurity rapidly and easily by providing a hollow susceptor made of porous carbon. CONSTITUTION:A manufacturing equipment of semiconductor consists of a reaction chamber 1, an air pipe 2, an exhaust pipe 3, a tube 4', a susceptor 5' and a high frequency heating coil 6. The susceptor 5' is heated by a high frequency radio wave and the heat is conducted to a substrate 7 for heating. The susceptor 5' is made of porous carbon and the inside 5A is hollow. This construction enables discharging a reaction gas rapidly and easily since the susceptor 5' is made of porous carbon even if the reaction gas is absorbed by the susceptor 5'.
申请公布号 JPS60254610(A) 申请公布日期 1985.12.16
申请号 JP19840109427 申请日期 1984.05.31
申请人 FUJITSU KK 发明人 NAKAI KENYA
分类号 H01L21/205;C23C16/458 主分类号 H01L21/205
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