| 摘要 |
PURPOSE:To form a highly accurate pattern in fewer man-hours, by etching an insulation film in a pattern region such that the corrosion is extended to some extent under the resist layer on the periphery thereof. CONSTITUTION:A resist layer 2 is formed around a pattern region of an insulation film 1 provided on a base substrate. The insulation film 1 in the pattern region is etched away such that corrosion is extended to some extent under the resist layer 1 and a corroded part 5 is formed there. Thus an end of the resist layer 2 is caused to overhang. A metallic film 4 is deposited on the insulation film 1 in the pattern region. This metallic film 4 is completely separated from a metallic film 4 deposited on the resist layer 2 due to the presence of the overhang. Accordingly, the metallic film on the resist layer 2 can be easily removed, and the pattern thus formed is free of burrs or the like. |
