发明名称 |
METHOD OF FORMING INSPECTING PATTERN |
摘要 |
<p>A method of forming inspection patterns for inspecting a workpiece, e.g., for electron beam inspection of optical photomasks. The inspection patterns are formed from the workpiece patterns themselves by applying a first positive windage to the workpiece patterns, inverting the first positive windaged workpiece patterns and applying a second positive windage to the inverted first positive windaged workpiece patterns. The inspection patterns so produced will contain the requisite guard band and the requisite overlap of abutting patterns.</p> |
申请公布号 |
JPS60201630(A) |
申请公布日期 |
1985.10.12 |
申请号 |
JP19840250668 |
申请日期 |
1984.11.29 |
申请人 |
INTERN BUSINESS MACHINES CORP |
发明人 |
UOORESU JIYOSEFU GIROOMU;JIYON FUAAREI ROORAN;JIYAN ROGOSUKII;ROBAATO AASAA SHINPUSON;EDOWAADO BIKUTAA UEBAA |
分类号 |
H01L21/66;G01B21/20;G03F1/44;G03F1/84;H01J37/30;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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