PLANAR MAGNETRON SPUTTERING METHOD

摘要

PURPOSE:To form a film of a uniform thickness by sputtering on a substrate of a large area by convexly curving a target toward the substrate so as to inhibit film formation on the central part of the substrate and to accelerate film formation on the peripheral part. CONSTITUTION:A prismatic pole piece 15 is placed at the center of a magnet structure so that the top of the piece 15 is projected toward a target 4' from the top of a tubular pole piece 16 placed around the piece 15. The target 4' curved convexly toward a substrate 10 on which a film is formed is set on a part where plasma is generated on the magnet structure. Sputtering is then carried out.