发明名称 Process and apparatus for etching copper masked by a nickel-gold mask
摘要 Process and apparatus for anisotropically etching copper through a nickel-gold mask on a circuit board. An electrical connection is made between the copper and the reactor wall or another electrical conductor contacted by the etching solution. The copper is removed anisotropically, without undercutting or lateral etching of the copper beneath the nickel-gold mask.
申请公布号 US4543153(A) 申请公布日期 1985.09.24
申请号 US19840611190 申请日期 1984.05.17
申请人 PSI STAR 发明人 NELSON, NORVELL J.
分类号 C23F1/08;C23F1/00;C23F1/02;H05K3/06;(IPC1-7):C23F1/02;B44C1/22;C03C15/00;C03C25/06 主分类号 C23F1/08
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