| 摘要 |
An exposure system for electrophotographic copiers, by which large originals such as engineering drawings can be exposed at high light intensity yet with the space requirement held to a minimum. The exposure is obtained by the provision of at least one tubular light source disposed parallel to a slit exposure zone at the side of that zone facing away from the image projection (optical) system and, at the side thereof facing toward the optical system, of tubular light sources disposed parallel to said zone in two equal groups arranged opposite to one another and adjacent to the reflection object space of the exposure system. The lamps of each of the two groups are closely spaced and have disposed closely about them a diffusely reflecting wall of a form generated by a straight line moving parallel to the lamps. The wall extends at one end at least to the vicinity of the exposure zone and at its opposite end extends at least to the reflection object space but not farther than the object space of the exposure system. |
