| 摘要 |
PURPOSE:To reduce the number of supplies and equalize the liquid distribution on a wafer during rotating by forming the upper surface of a wafer chuck of a positive resist developing unit in a recess shape, thereby decreasing the flowout developer from the wafer and reducing the number of supplies. CONSTITUTION:A wafer 302 is attracted by a chuck 302 having a recess upper surface, attracted to the recess, the component of gravity acted on the developer 402 on the wafer cancels the centrifugal force at the rotating time, thereby reducing the flowed developer. Thus, the number of supplying the developer is reduced, the distribution of the developer becomes uniform on the wafer, and the irregularity of the developing effect can be eliminated to improve the yield, thereby remarkably reducing the irregularity of the quality improved in the yield. Thus, this can be also applied to the negative resist development. |
