| 摘要 |
PURPOSE:To form a thin TiBN film having the golden luster equal to the luster of TaC by specifying the ratio of BCl3, N2 in reactive gas in the stage of forming the thin TiBN film on the surface of an ornamental article by a plasma chemical depsotion method. CONSTITUTION:An ornamental article 7 such as a watch case or the like is placed on the cathode 5 in a reaction chamber 1 and the inside of the chamber is maintained under about 0.05Torr Ar atmosphere. The surface of said article is cleaned by Ar sputtering. Gaseous BCl3 9 bubbled by gaseous N2 8 and gaseous H2 10 and gaseous TiCl4 11 bubbled by gaseous H2 10' are supplied into the chamber 1. The gaseous mixture thereof is so adjusted that N2 and BCl3 therein are incorporated at 5%<=BCl3/(N2+BCl3)<=40% and glow discharge is generated between an anode 6 and the cathode. The thin TiBN film of >=0.1mum thickness having the golden luster equal to the luster of TaC satisfying the relation 40%<= L*<=80%, 49<=(a*)<2>+(b*)<2=625, 3<=b*/a*<=8 in the L*, a*, b* color space speci fied by JIS.Z.8105-2068 is obtd. |
