| 摘要 |
PURPOSE:To reduce the occupation floor space of the titled device by a method wherein a substrate cassette mounting device and a shut-off device are provided in a preparatory chamber, and a substrate conveying device is also provided in the same preparatory chamber, thereby enabling to have the floor occupied by the preparatory chamber for common use with an asher chamber. CONSTITUTION:An ahser chamber 40 is provided at the lower part of a preparatory chamber 30 in such a manner that the chamber 40 is communicated to the preparatory chamber 30. A substrate cassette mounting tool 50 and a shut-off tool 51 are provided in the preparatory chamber in such a manner that they perform a vertical movement. In the preparatory chamber 30, a substrate conveying device such as a conveying belt 70, for example, is provided in such a manner that a part of which performs a pivotal movement. To be more precise, a substrate 61 is picked out from the lower side of a substrate cassette 60, and the substrate 61 is pivotally provided at the point located between the withdrawable position and the position where the vertical movement of the substrate cassetted mounting tool 50 and a shut-off tool 51 will not be impaired. In this case, said substrate 61 is provided in such a manner that it is pivotally moved between the horizontal position and the position along the side wall of the preparatory chamber 30. The substrate 61 on which photoresist is coated is carried into the preparatory chamber 30 through an aperture part 31 and, as a result, the prescribed number of the substrate 61 are placed in the substrate cassette 60 which is attached to the substrate cassette mounting tool 50. |
