发明名称 |
Epitaxial wafer of compound semiconductor display device |
摘要 |
An epitaxial wafer of a compound semiconductor comprising a single crystalline semiconductor substrate consisting of GaP and an active layer consisting of GaAs1-xPx, having a mixed crystal ratio (x) in the range of from 0.5 to 1 is used for an LED. According to the present invention, between the single crystalline semiconductor substrate and the active layer, a light-absorbing layer consisting of GaAs1-xPx having the mixed crystal ratio (x) smaller than that of the active layer, is formed to suppress the reflection of light from the surface of the substrate.
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申请公布号 |
US4510515(A) |
申请公布日期 |
1985.04.09 |
申请号 |
US19840578600 |
申请日期 |
1984.02.10 |
申请人 |
STANLEY ELECTRIC CO., LTD.;MITSUBISHI MONSANTO CHEMICAL CO., LTD. |
发明人 |
KAJITA, MASAKI;NAKAYA, TOMIO;HASEGAWA, SHINICHI;FUJITA, HISANORI |
分类号 |
H01L33/00;H01L33/02;(IPC1-7):H01L29/161;H01L29/205 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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