| 摘要 |
PURPOSE:To sufficiently prevent contamination of a sample by providing a sample entrance chamber which may be vacuumed and a sample drawing chamber in both sides of an etching chamber through a gate valve and by moving a susceptor between them on the occasion of housing a susceptor on which a sample to be etched is placed within the etching chamber and then executing the etching by irradiation of ultraviolet ray through a transparent window. CONSTITUTION:A susceptor 5 on which a sample 10 to be etched is placed is housed within an etching chamber 4, this chamber 4 is vacuumed to about 1X 10<-6>Torr by an exhaustion device 14 through a gate valve 13 and reactiongas is supplied thereto from a gas inlet system 6. Thereafter, the sample 10 is irradiated with the ultraviolet ray 8 from an Hg-Xe lamp through an ultraviolet ray transparent window 7 provided opposingly to said sample for the specified etching. With such constitution, almost similar sample entrance chamber 1 and sample drawing chamber 22 are connected through the gate valves 3 and 9 in both sides of the chamber 4 and the sample 10 is moved under the vacuum condition between these chambers. |
