| 发明名称 |
A method and apparatus for ion beam generation. |
| 摘要 |
<p>A method and apparatus for ion beam generation are disclosed wherein opposed targets (T1, T2) are sputtered by plasma produced in a space confined by these targets (T1, T2) and ionized particles (10) thereby produced are emitted from the space in a given direction in an electric field (E). </p> |
| 申请公布号 |
EP0132398(A1) |
申请公布日期 |
1985.01.30 |
| 申请号 |
EP19840304963 |
申请日期 |
1984.07.20 |
| 申请人 |
KONISHIROKU PHOTO INDUSTRY CO. LTD. |
发明人 |
NAOE, MASAHIKO;ISHIBASHI, SHOUZO |
| 分类号 |
C23C14/00;C23C14/06;C23C14/22;C23C14/35;G11B5/851;H01J27/14;H01J37/08;(IPC1-7):H01J27/02;G11B5/84;C23C14/48 |
主分类号 |
C23C14/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
