发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To develop an exposed photosensitive layer with only water without requiring an org. solvent by using a latex polymer having cationic groups, a water-soluble ethylenic unsated. compound having anionic groups, and a photopolymn. initiator. CONSTITUTION:This photosensitive resin composition consists essentially of a latex polymer having cationic groups, a water-soluble ethylenic unsatd. compound having anionic groups, and a photopolymn. initiator. Since the latex polymer and the ethylenic unsatd. compound are dissolved or dispersed well in water because of the ionized state, the photosensitive resin composition requires only water as a solvent. When the composition is exposed, the uncured parts are dissolved in water and removed, and the cured parts are made hydrophobic by the physical and chemical bond of a polymer of the unsatd. compound to the latex polymer to form a film of high strength. At this time, environmental pollution and safety and hygienic problems are not caused. When the photosensitive resin composition is used in the manufacture of a printing plate, the cured parts are not swollen, so the parts have satisfactory resolving power and high ink retentivity.
申请公布号 JPS603623(A) 申请公布日期 1985.01.10
申请号 JP19830111710 申请日期 1983.06.21
申请人 KONISHIROKU SHASHIN KOGYO KK 发明人 NOGAMI AKIRA;SASA NOBUMASA
分类号 C08F2/00;C08F2/48;G03F7/004;G03F7/027;G03F7/032;G03F7/033;H05K3/06;(IPC1-7):G03C1/68;G03F7/10 主分类号 C08F2/00
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