| 摘要 |
PURPOSE:To form a stable functional thin film by freezing temporarily water to be introduced before vapor deposition or sputtering when water is introduced in a thin film, and melting the frozen water and introducing it into a vacuum tank during vapor deposition. CONSTITUTION:An H2O supply cylinder 11 is detached from a joint 16 and inserted into a container filled with a freezing mixture to cool and solidify the H2O in the cylinder 11. The container 12 filled with the freezing mixture is connected to the side of the vacuum tank 1 as it is after the H2O in the cylinder 11 is solidified completely, and a valve 9 and a stop valve 10 are opened fully to evacuate the vacuum tank 1. No H2O vaporizes in said state and the oxygen dissolved in the H2 is removed. The H2 in the cylinder 11 is melted and then controllers 14 and 14' are set to constant temperatures above 0 deg.C. The vapor pressure of pure H2O is controlled only by controlling a leak valve 9 during vapor deposition or sputtering to perform the vapor deposition or sputtering.
|
