| 摘要 |
PURPOSE:To obtain simply a silane for reactions in gaseous phase, containing no silicon oxide impurities, by blending a silane with hydrogen fluoride, making silicon oxide impurities contained in the silane into water and silicon fluoride, removing them by cold trap. CONSTITUTION:A silane (e.g., SiH4) containing silicon oxide impurities and about 0.1-20wt% hydrogen fluoride are packed into the sufficiently dehydated first container 31, blended, and the silicon oxide impurities contained in the silane is made into water and silicon fluoride by the reaction shown by the formula. The silane is sent through the second container 40 cooled and kept at -65--110 deg.C by the liquid nitrogen 35 to the doping system 20 and the reaction system 10. Consequently, water, silicon fluoride, and hydrogen fluoride contained in the silane are trapped as solid or liquid in the container 40, only the silane is purified, and sent to the doping system 20 in a state of the silicon oxide impurities removed.
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