| 摘要 |
PURPOSE:To obtain a resist pattern high in precision with good reproducibility and ease by coating the surface of a stage for placing a substrate with a reflection preventing film. CONSTITUTION:Illumination light 1, a transparent substrate 2, a reflection preventing film 3, and a stage 4 are illustrated. This light 1 has passed through the transparent part of a photomask, and the substrate 2 is coated wholly with a photoresist film. Since the reflection preventing film 3 coats the surface of the stage 4, reflection little occurs, and a high precision pattern can be obtained. |
