发明名称 ELECTROPLATING METHOD
摘要 PURPOSE:To lower the high electric resistance of an electrically conductive film and to enable high-speed plating by making the interval between cathode and anode small, the area of the anode small and the area of the cathode large. CONSTITUTION:A cathode panel 1 is suspended and fixed in a plating bath. A pair of anode panels 2 having a much smaller area than the cathode panel 1 are plated on both sides of the cathode panel 1 so that the interval between each of the anode panels 2 and the cathode panel 1 is made as small as possible. While the anode panels 2 are simultaneously moved back and forth with respect to a central-line of the panel 1, shown by the chain line, over a necessary distance, electroplating is carried out.
申请公布号 JPS6293393(A) 申请公布日期 1987.04.28
申请号 JP19850231003 申请日期 1985.10.18
申请人 SAWA HYOMEN GIKEN KK;DAIICHI DENSHI KOGYO KK 发明人 SAWA NORINARI;SANETOU MITSUTOSHI
分类号 C25D7/00;C25D5/00;C25D7/06;C25D21/00;H05K3/18;H05K3/24 主分类号 C25D7/00
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