| 摘要 |
<p>PCT No. PCT/EP82/00171 Sec. 371 Date Apr. 14, 1983 Sec. 102(e) Date Apr. 14, 1983 PCT Filed Aug. 13, 1982 PCT Pub. No. WO83/00641 PCT Pub. Date Mar. 3, 1983.Solid and liquid, especially high-boiling, impurities are removed from a gas stream containing solvent vapors in such a manner that the gas stream is washed with the condensate of one or more solvent vapors contained in the gas stream, preferably with the fraction which has the greatest affinity for the impurities to be removed. After a distillatory separation of the impurities, as befits the goals of the process, the solvent or solvent mixture used for the washing process is returned again into the process, preferably after it has been removed from the gas stream by condensation and/or adsorption. The gas stream can be returned into a vaporization chamber where it is again charged with solvent vapors.</p> |
