发明名称 MANUFACTURE OF SPATTERING TARGET
摘要 PURPOSE:To enable spattering without wasting spattering material and avoiding deterioration of atmosphere by melting, solidifying and filling spattering material in as erosion area formed on the surface of material having higher melting point than the spattering material by a magnetron spatter. CONSTITUTION:A material having higher melting point than spattering material is worked to the shaped body 20 of a target. This is mounted to, for instance, a flat plate magnetron spattering device and usual magnetron spattering is performed to form an erosion area 21 on the shaped body 20. This shaped body 20 is taken out from the spattering device, and small pieces 22 of the spattering material are placed on the area 21. The small pieces 22 are heated and molten and accumulated in the hollow of the area 21. Then, it is cooled to obtaine a target 23. When spattering is carried out using this, almost 100% of the spattering material 24 can be utilized. No opening is formed between the spattering material 24 and the shaped body 20, and accordingly, atmosphere in the chamber is not deteriorated.
申请公布号 JPS58130276(A) 申请公布日期 1983.08.03
申请号 JP19820011481 申请日期 1982.01.29
申请人 NIPPON VICTOR KK 发明人 MIYAJIMA SHIN
分类号 C23C14/36;C23C14/34;C23C14/35 主分类号 C23C14/36
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