发明名称 VACUUM PROCESSING DEVICE
摘要 PURPOSE:To reduce the velocity of flow of the jet of an introducing gas, and to prevent the adhesion of dust onto the surface of a substrate by providing the supply port of the introducing gas with a duct-shaped shielding box. CONSTITUTION:The duct-shaped shielding box 4 is set up adjoined to the supply port 2 of the introducing gas, the jet of the gas is made collide, the velocity of flow is reduced sufficiently, and the gas is discharged from an opening. The opening section is formed downward to prevent the deposition of dust, and the gas is discharged from a large number of small holes. A substrate case 3 is covered with a cover 8, the substrate is protected when the gas is supplied into a vacuum chamber, and pleats are formed to the floor surface 9 of the vacuum chamber to prevent the fly-up of dust. In said constitution, the gas is introduced from a vacuum state in a short time and can be brought to atmospheric pressure, and the adhesion of dust onto the surface of the substrate can be obviated.
申请公布号 JPS58125844(A) 申请公布日期 1983.07.27
申请号 JP19820007589 申请日期 1982.01.22
申请人 HITACHI SEISAKUSHO KK 发明人 TSUJIMOTO KAZUNORI;MIZUTANI TATSUMI;SUZUKI MICHIO
分类号 H01L21/02;H01L21/00;(IPC1-7):01L21/68 主分类号 H01L21/02
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