MARK FOR ALIGNMENT ON SEMICONDUCTOR WAFER AND MANUFACTURE THEREOF,申请号JP19810188654-传众专利搜索

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发明名称	MARK FOR ALIGNMENT ON SEMICONDUCTOR WAFER AND MANUFACTURE THEREOF
摘要	PURPOSE:To form an alignment mark havng a large contrast, by interposing a region defined by a flat surface between regions where a multiplicity of minute cavities each having a circular cross section are arranged. CONSTITUTION:At a predetermined position on a main surface 2 of a semiconductor wafer 1, at least two regions 4 and 5 are formed each of which has a multiplicity of minute cavities 3 arranged therein. In addtion, a region 7 defined by a linearly elongated flat surface 6 is disposed between the regions 4, 5. In this case, the minute cavities 3 are linearly elongated adjacently to each other. Such an alignment mark has no regular reflection at the cavities 3 in the regions 4, 5 but has a regular reflection at the flat surface 6 in the region 7. Thus, it is possible to form an alignment mark having a large contrast.
申请公布号	JPS5890728(A)	申请公布日期	1983.05.30
申请号	JP19810188654	申请日期	1981.11.25
申请人	NIPPON DENSHIN DENWA KOSHA	发明人	KINOSHITA HIROO;ONO TOSHIROU
分类号	H01L21/68;G03F9/00;H01L21/027;H01L21/30;H01L21/67	主分类号	H01L21/68
代理机构		代理人
主权项
地址

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