| 摘要 |
PURPOSE:To generate directional vapor with high density and to improve the efficiency of evaporation by placing a nozzle having a throttling part and an expanding part in the opening of a vapor depositing device. CONSTITUTION:A throttling part 9 is provided at a specified distance upward to a nozzle 8 placed on the opening of an evaporating device 2 and an expanding part 10 upward from the part 9. The axial length of the nozzle 8 is made larger than the opening diameter of the device 2, and a heating mechanism such as a coil 5 for heating is provided around the same. The vapor evaporated from a material 3 to be evaporated by such mechanism is made into high density and high speed in the throttling part 9 of the nozzle 8, and passes through a space having an angle suitably, whereby the vapor 4' having directivity is generated. The distributions in film thickness are made uniform by this device, and treating capacity is improved with the small and narrow vapor depositing surfaces. |
